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表面化学教程

Application ID: 9663


本案例模型显示如何模拟化学气相沉积(CVD)中的表面反应和物质分布。模型中,硅在一个圆片上生长,系统中的总质量和摩尔浓度守恒。最后,得到了沉积的硅的厚度与时间的函数关系。

This model is included as an example in the following products:

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The combination of COMSOL® products required to model your application depends on several factors and may include boundary conditions, material properties, physics interfaces, and part libraries. Particular functionality may be common to several products. To determine the right combination of products for your modeling needs, review the 技术规格表 and make use of a free evaluation license. The COMSOL Sales and Support teams are available for answering any questions you may have regarding this.