A Model of a Horizontal Atmospheric Pressure Chemical Vapor Deposition ReactorT. Adams
Naval Surface Warfare Center Crane Division, CRANE, IN, USA
A model of a horizontal atmospheric pressure chemical vapor deposition reactor was implemented to aid in the design of a laboratory based one.
The model coupled momentum transport, energy transport, and mass transport phenomena to account for reacting fluid flow of a compressible gas in a heated chamber. The system modeled was silicon deposition from trichlorosilane in hydrogen carrier gas.