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COMSOL Multiphysics® Simulations of Graphene Chemical Vapor Deposition (CVD) Growth

K. M. Al-Shurman[1], H. Naseem[1]
[1]The Institute for Nanoscience & Engineering, University of Arkansas, Fayetteville, AR, USA
发布日期 2014

Chemical vapor deposition (CVD) is a promising effective method for synthesis of graphene films. CVD graphene film is obtained from hydrocarbon species such as CH4 through complex catalytic chemical reactions on the surface of the catalyst. Therefore, studying the catalytic reaction kinetics is essential process for understanding the thermal decomposition rate of methane on catalyst surface as well as the reaction mechanisms. In this study, COMSOL Multiphysics® is used to investigate graphene chemical vapor deposition process on Cu surface. Also, the final thickness of graphene film was calculated.

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