Thermal Simulation of an Evaporation Reactor

H. Rouch, and S. Desbois
INOPRO
Villard de Lans, France
发布日期 2011

In this article we present Simulations results of an evaporation reactor for optical layer applications. The thermal simulation concern the source of the evaporated material. An experimental problem is ralated to the shape of the material powder surface: due to the evaporation rate, the surface don\'t keep his flat initial shape and this has a strong effect on the local evaporation rate.

In this process there is a strong coupling between thermal effects and the position of the surface of the powder. Then the simulation aim is to take in account heat transfer by conduction and radiation as well as evaporation direct and non direct effects on thermal transfer. The presented simulation are a coupled solving of heat transfers including heat of state change of the material, and ALE model to follow the powder surface change during evaporation.

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