科技论文和演示页面包括了 COMSOL 全球用户年会上所有的用户演示文稿。这些演示文稿介绍了 COMSOL 用户是如何使用 COMSOL Multiphysics 进行创新性研究和产品设计,研究主题涵盖了包括电气、机械、流体和化工等范围广泛的行业和应用领域。您可以使用“快速搜索”来查找与您研究领域相关的演示文稿。

COMSOL Multiphysics Applied to MEMS Simulation and Design

Dr. Piotr Kropelnicki[1]
Mu Xiao Jing[1]
Wan Chia Ang[1]
Cai Hong[1]
Andrew B. Randles[1]

[1]Institute of Microelectronics, Agency for Science, Technology and Research, Singapore, Singapore

In this research, we performed multiple COMSOL Multiphysics® simulations. We analyzed the dispersion curves of waves in a LAMB wave pressure sensor; ...

Design of MEMS Based 4-Bit Shift Register

V. B. Math[1], B. G. Sheeparamatti[1], A. C. Katageri[1]
[1]Basaveshwar Engineering College, Bagalkot, Karnataka, India

This paper presents a unique design of MEMS based 4-bit shift register that perform shifting operation same as logic devices that are composed of solid ...

VLSI Layout Based Design Optimization of a Piezoresistive MEMS Pressure Sensors using COMSOL Multiphysics

R. Komaragiri[1], Sarath. S.[1], N. Kattabomman[1]
[1]NIT Calicut, Kozhikode, Kerala

This paper focuses on the diaphragm design and optimization of a piezoresistive Micro Electro Mechanical System (MEMS) pressure sensor by considering ...

Ribbon Formation in Twist-Nematic Elastomers

L. Teresi[1], V. Varano[1]
[1]LaMS - Modelling & Simulation Lab, Università degli Studi Roma Tre, Roma, Italy

Nematic Elastomers (NEs) possess both the elastic properties of rubbers and the orientational properties of liquid crystals. Those two properties makes ...

Model of an Interdigitated Electrodes System for Cell Counting Based on Impedance Spectroscopy

E. Bianchi[1][2], F. Bellati[1], E. Rollo[2], G. Dubini[1], C. Guiducci[2]
[1]Politecnico di Milano, LaBS, Laboratory of Biological Structure Mechanics, Milano, Italy
[2]Swiss Federal Institute of Technology (EPFL), Laboratory of Life Sciences Electronics - Swiss Up Chair, Lausanne, Switzerland

A model of a cell counter sensor based on Impedance Spectroscopy (IS) has been implemented in COMSOL Multiphysics. The cell counter is a silicon-based ...

Simulation of DC Current Sensor

K. Suresh, B.V.M.P.S. Kumar, U.V. Kumar, M. Umapathy, and G. Uma
National Institute of Technology Tiruchirapalli, Tamil Nadu, India

A proximity DC current sensor using of a piezo sensed and actuated cantilever beam with a permanent magnet mounted at its free end is designed and simulated in COMSOL Multiphysics. The change in resonant frequency of cantilever is a measure of the current through the wire. The sensor is found to be linear with good sensitivity.

Design and Analysis of Micro-tweezers with Alumina as Gripper Using COMSOL Multiphysics

V. S. Selvakumar, M. S. Gowtham, M. Saravanan, S. Suganthi, and L. Sujatha
Rajalakshmi Engineering College
Chennai, India

Micro-tweezers have been widely investigated because of their extensive applications in micro-fluidics technology, microsurgery and tissue-engineering. ...

Air Convection on a Micro Hotplate Gas Sensor

S. Gidon[1], M. Brun[1], S. Nicoletti[1], P. Barritault[1]
[1]Commissariat Energie Atomique, LETI, Minatec Campus, Grenoble, France

Monitoring of indoor CO2 concentration is of particular interest to detect room occupancy in order to optimize power consumptions of building. One ...

Studies of Lead Free Piezo-Electric Materials Based Ultrasonic MEMS Model for Bio sensor

P. Pattanaik[1], S. K. Kamilla[1], D. P. Das[2], S. K. Pradhan[3]
[1]MEMS Design Center, Institute of Technical Education & Research (ITER), Sikhya ‘O’ Anushandhan University, Bhubaneswar, Odisha, India
[2]Process Engineering and Instrumentation Lab, Institute of Minerals and Materials Technology (IMMT), Bhubaneswar, Odisha, India
[3]Dept of ECE, Hi-Tech Institute of Technology, Khurda, Odisha, India

This paper describes the design of an ultrasonic transducer using different lead free piezo-electric materials and evaluates their performance with ...

Modeling Directed Self-Assembly of Block Copolymers for Lithographic Applications

A. Fouquet [1], R. Orobtchouk [2], J. Hazart [1],
[1] CEA-LETI, Grenoble, France
[2] Institut des Nanosciences de Lyon (INL), Villeurbanne, France

Nano patterning for chip manufacturing has reached its limitation with 193i lithography standard process. Directed Self Assembly (DSA) of Block Co ...