Discussion Forum

So I have been continuing to investigate sources of error in my simulation and here is where I think a main issue arises. I am trying to do deposition at the bottom of the pores where as in the "Electrochemical Copper Deposition" example they are depositing everywhere. The problem seems to be the way the mesh grows. If I take that simulation and set the mesh growth to 0 on the walls and the top along with making them insulators it doesnt converge and in the attachment you can see how the bottm grows into the walls and the solution stars to diverge. If i set the walls and the tops to be insulators but allow growth of the mesh using the same formula as from the copper deposition file the mesh grows even though I have the top and sides set as insulators and thus there shoulnt be any flux to cause this. I am thus baffeled on how to go about fixing this at the moment. I am assuming I need to change the wall and top growth some how but no sure how. I bassically dont want the sides to grow, just the bottom of the pore to grow up. If anayone know how to do that that would be much appreciated.

Hi Matt,
I was wondering if you could sort out the problems in your model. i am trying to model a similar system and I am getting "inverted mesh " warning all the time.

Thanks in advance,
Sanket