论文和技术资料

Zulhaj Rizki¹, Maarten Schutyser^1
1Wageningen University

P. Juhász[1], S. Beleznai[1], I. Maros[1]
[1]Budapest University of Technology and Economics, Budapest, Hungary

C. Gavrila[1], C. P. Lungu[2], and I. Gruia[3]
[1]Technical University of Civil Engineering Bucharest, Romania
[2]National Institute for Laser, Plasma and Radiation Physics, Bucharest, Romania
[3]University of Bucharest, Faculty of Physics, Bucharest, Romania

B.S. Patil[1], Q. Wang[2], V. Hessel[2], J. Lang[3]
[1]Eindhoven University of Technology, Eindhoven, The Netherlands
[2]Micro Flow Chemistry and Process Technology, Eindhoven University of Technology, Eindhoven, The Netherlands
[3]Innovation Management, Verfahrenstechnik & Engineering, Evonik Industries AG, Hanau-Wolfgang, Germany

L. W. Cross[1], M. J. Almalkawi[2]
[1]Imaging Systems Technology, Toledo, OH, USA
[2]EECS Department, College of Engineering, University of Toledo, Toledo, OH, USA

J. Rojo, S. Ognier, and S. Cavadias
Laboratoire de Génie des Procédés Plasmas et Traitements de Surfaces, University Pierre et Marie Curie, Paris, France

V. BRUYERE¹, P. NAMY¹, A. BROSSE², M. LALLIER^3
1SIMTEC, 5 rue Felix Poulat, GRENOBLE, France
²FRAMATOME, 2 Rue Professeur Jean Bernard, LYON, FRANCE
³FRAMATOME, 27 rue de l’industrie, JEUMONT, FRANCE

Lav Kaushik^1
1LAM Research

童琛琛^1
1上海量维信息科技有限公司

J. Brcka
TEL US Holdings, Albany, NY, USA